9:00

Registration

9:15

Welcome address

Prof. Fuhua Yang, IOSCAS

9:20

Latest improvements on nanolithography and �fabrication

Andre Linden, Product Marketing Manager, Raith Asia Ltd

9:40

特邀报告Invitation：

EBL fabrication of micro & nano optical elements and their applications

Prof. Xiaocong Yuan

10:10

Raith150电子束曝光设备在纳米结构器件中的应用

Dr. Weihua Han, IOSCAS (韩伟华，中科院半导体所集成技术中心)

10:30

Coffee Break, taking photoes

10:45

Electron Beam Lithography: EBL Basics, EBL Equipment and related Technologies

Dr. Guido Piaszenski, Raith GmbH

11:15

图形发生器与FIB集成后的所做的一些工作

Dr. Kaiwu Peng, NCNST（彭开武，国家纳米科学中心）

11:35

利用EBL制作基于微环/微盘谐振腔的硅光子器件

Qingzhong Huang, IOSCAS(黄庆忠，中科院半导体所光电子研发中心)

12:15

Lunch

13:30

Controlled undercut profile in bi-layer E-beam lithography resists

Dr. Xiaoxiang Xia, IOPCAS (夏晓翔，中科院物理所)

13:50

利用EBL所做的一些工作

Dr. Zhiyong Zhang, Peking University (张志勇, 北京大学电子系)

14:10

It is a small world

Dr. Keith Moulding, Director, Raith Asia Ltd

14:30

纳米点接触沟道晶体管的制备与研究

Xiang Yang, IOSCAS (杨香，中科院半导体所集成技术中心)

14:50

Coffee Break

15:10

ionLiNE

Andre Linden, Product Marketing Manager, Raith Asia Ltd

15:40

基于SOI亚微米尺寸脊型波导的高速电光调制器和光开关

Xuejun Xu, IOSCAS (徐学俊，中科院半导体所光电子研发中心)

16:00

Question and answer/ Discussion

17:30

Banquet